Bezmaksas piegāde pasūtījumiem virs 29€

  • check 10+ miljoni grāmatu
  • check Jaunumi katru dienu
  • check Vairāk nekā 1 miljons klientu mums uzticas
  • check Labas cenas un atlaides
  • check Piegāde visā Eiropā

MOS Interface Physics, Process and Characterization - Shengkai Wang,Xiaolei Wang

angļu valoda
2024-01-29
99,67 € 142,38 €

-30% ar kodu BOOKS

Piegādātāja noliktavā

Piegāde 15-21 darba dienu laikā

30 dienu atgriešanas politika

The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit, and is therefore a fundamental building block of the information society. Indeed, high quality MOS structure is the key to achieving high performance devices and integrated circuits. Meanwhile, the control of interface physics, process and characterization methods det ... Pilns apraksts

Jums varētu patikt arī

Aprašymas

The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit, and is therefore a fundamental building block of the information society. Indeed, high quality MOS structure is the key to achieving high performance devices and integrated circuits. Meanwhile, the control of interface physics, process and characterization methods determine the quality of MOS structure.This book tries to answer five key questions: Why are high-performance integrated circuits bonded together so closely with MOS structure? Which physical phenomena occur in MOS structure? How do these phenomena affect the performance of MOS structure? How can we observe and quantify these phenomena scientifically? How to control the above phenomena through process? Principles are explained based on common experimental phenomena, from sensibility to rationality, via abundant experimental examples focusing on MOS structure, including specific experimental steps with a strong level of operability.This book will be an essential reference for engineers in semiconductor related fields and academics and postgraduates within the field of microelectronics.

Vairāk informācijas

Autors Shengkai Wang, Xiaolei Wang
Izdevējs CRC Press
Izlaides gads 2024
Vāka tips Mīkstais vāks
EAN 9781032106281
Rakstiet savu atsauksmi
Jūs vērtējat: MOS Interface Physics, Process and Characterization
Jūsu novērtējums:

Goodreads atsauksmes

99,67 € 142,38 €