Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Tien-Chien Jen,Sina Karimzadeh,Oluwatobi Adeleke
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
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Aprašymas
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Vairāk informācijas
| Autors | Tien-Chien Jen, Sina Karimzadeh, Oluwatobi Adeleke |
|---|---|
| Izdevējs | CRC Press |
| Izlaides gads | 2023 |
| Vāka tips | Cietais vāks |
| EAN | 9781032386706 |